首页> 外国专利> NITROGEN DOPED AND VACANCY DOMINATED SILICON INGOT AND THERMALLY TREATED WAFER FORMED THEREFROM HAVING RADIALLY UNIFORMLY DISTRIBUTED OXYGEN PRECIPITATION DENSITY AND SIZE

NITROGEN DOPED AND VACANCY DOMINATED SILICON INGOT AND THERMALLY TREATED WAFER FORMED THEREFROM HAVING RADIALLY UNIFORMLY DISTRIBUTED OXYGEN PRECIPITATION DENSITY AND SIZE

机译:掺氮和空位掺杂的硅锭和热处理过的硅片,形成了径向均匀分布的氧气沉淀密度和尺寸

摘要

Nitrogen-doped CZ silicon crystal ingots and wafers sliced therefrom are disclosed that provide for post epitaxial thermally treated wafers having oxygen precipitate density and size that are substantially uniformly distributed radially and exhibit the lack of a significant edge effect. Methods for producing such CZ silicon crystal ingots are also provided by controlling the pull rate from molten silicon, the temperature gradient and the nitrogen concentration. Methods for simulating the radial bulk micro defect size distribution, radial bulk micro defect density distribution and oxygen precipitation density distribution of post epitaxial thermally treated wafers sliced from nitrogen-doped CZ silicon crystals are also provided.
机译:公开了氮掺杂的CZ硅晶体锭和从其切成的晶片,其提供了具有氧沉淀物密度和尺寸的后外延热处理晶片,所述氧沉淀物的密度和尺寸基本均匀地径向分布并且缺乏明显的边缘效应。还提供了通过控制来自熔融硅的提拉速率,温度梯度和氮浓度来生产这种CZ硅晶体锭的方法。还提供了模拟从掺氮CZ硅晶体切出的外延后热处理晶片的径向体积微缺陷尺寸分布,径向体积微缺陷密度分布和氧析出密度分布的方法。

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