首页> 外国专利> Nitrogen doped and vacancy dominated silicon ingot and thermally treated wafer formed therefrom having radially uniformly distributed oxygen precipitation density and size

Nitrogen doped and vacancy dominated silicon ingot and thermally treated wafer formed therefrom having radially uniformly distributed oxygen precipitation density and size

机译:氮掺杂和空位占主导地位的硅锭和由其形成的热处理的晶片,其具有径向均匀分布的氧气沉淀密度和尺寸

摘要

Nitrogen-doped CZ silicon crystal ingots and wafers sliced therefrom are disclosed that provide for post epitaxial thermally treated wafers having oxygen precipitate density and size that are substantially uniformly distributed radially and exhibit the lack of a significant edge effect. Methods for producing such CZ silicon crystal ingots are also provided by controlling the pull rate from molten silicon, the temperature gradient and the nitrogen concentration. Methods for simulating the radial bulk micro defect size distribution, radial bulk micro defect density distribution and oxygen precipitation density distribution of post epitaxial thermally treated wafers sliced from nitrogen-doped CZ silicon crystals are also provided.
机译:公开了氮掺杂的CZ硅晶锭和切片的晶片,其提供用于具有氧沉淀密度和尺寸的后外延热处理晶片,其基本上均匀地分布径向并表现出缺乏显着的边缘效应。 还通过控制来自熔融硅,温度梯度和氮浓度的拉伸速率来提供这种CZ硅晶锭的制备方法。 还提供了模拟径向散装微缺陷尺寸分布,从掺杂的CZ硅晶体切片的外延热处理晶片的径向散装微缺陷密度分布,径向散装微缺陷密度分布和氧沉淀密度分布。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号