首页> 外国专利> SiC SINGLE CRYSTAL CONJUGATE, SiC SINGLE CRYSTAL CONJUGATE MANUFACTURING METHOD, SiC INGOT MANUFACTURING METHOD, AND SiC WAFER MANUFACTURING METHOD

SiC SINGLE CRYSTAL CONJUGATE, SiC SINGLE CRYSTAL CONJUGATE MANUFACTURING METHOD, SiC INGOT MANUFACTURING METHOD, AND SiC WAFER MANUFACTURING METHOD

机译:SiC单晶共轭物,SiC单晶共轭物的制造方法,SiC锭的制造方法,以及SiC晶片的制造方法

摘要

PROBLEM TO BE SOLVED: To provide an SiC single crystal conjugate capable of suppressing the formation heterogeneous polymorphism even if a SiC ingot is long-sized, and an SiC ingot manufacturing method for using the SiC single crystal conjugate as a seed crystal thereby to grow a SiC single crystal.;SOLUTION: An SiC single crystal junction 10 has a junction 3, in which the common crystal faces of two SiC single crystals 1 and 2 are jointed to form joint faces 1a and 1b, and in which the [0001] faces of the two single crystals 1 and 2 are inclined at 0 to 1° across the junction 3 with respect to a direction normal to the junction 3. In a SiC ingot manufacturing method, the SiC single crystals are subjected to a crystal growth on one face of the SiC single crystal junction 10.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2017,JPO&INPIT
机译:解决的问题:提供一种即使单晶硅锭尺寸大也能够抑制形成不均一的多晶型的单晶硅共轭物,以及使用该单晶硅共轭物作为籽晶从而生长出SiC的单晶硅的制造方法。 SiC单晶;解决方案:SiC单晶结10具有结3,其中两个SiC单晶1和2的公共晶面接合在一起以形成接合面1a和1b,并且其中[0001]面两个单晶1和2中的单晶中的一个相对于垂直于结3的方向在结3上倾斜0至1°。在SiC锭制造方法中,使SiC单晶在一个面上进行晶体生长。 SiC单晶结10的结构;;部分图纸:图1;版权:(C)2017,JPO&INPIT

著录项

  • 公开/公告号JP2017119596A

    专利类型

  • 公开/公告日2017-07-06

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;DENSO CORP;

    申请/专利号JP20150256630

  • 发明设计人 TAKAHANE HIDETAKA;FUJIKAWA YOHEI;

    申请日2015-12-28

  • 分类号C30B29/36;

  • 国家 JP

  • 入库时间 2022-08-21 13:57:50

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