Surface unevenness detecting apparatus for a semiconductor film, the surface unevenness detection method of a laser annealing apparatus and the semiconductor film

摘要

PROBLEM TO BE SOLVED: To facilitate the setting of an optimum energy density, by determining unevenness occurring in a thin film by laser anneal specifically and exactly.SOLUTION: A surface unevenness detector for detecting surface unevenness on a semiconductor film irradiated with laser light and annealed includes an inspection light output unit for irradiating the semiconductor film with inspection light, a reflection light receiving unit for receiving the reflection light from the semiconductor film as a color image, an operation unit for digitizing the surface unevenness of the semiconductor film based on the color components of a color image received at the reflection light receiving unit, and a display unit for displaying based on the relationship of the digitized surface unevenness and the energy density of laser light with which a substrate is irradiated. Surface unevenness of the semiconductor film is grasped exactly by displaying based on the relationship of the digitized surface unevenness and the energy density of laser light, thus facilitating selection of a proper energy density.SELECTED DRAWING: Figure 3