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Monomer for hard mask composition, hard mask composition containing the monomer, and pattern forming method using the hard mask composition
Monomer for hard mask composition, hard mask composition containing the monomer, and pattern forming method using the hard mask composition
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机译:硬掩模组合物用单体,含有该单体的硬掩模组合物以及使用该硬掩模组合物的图案形成方法
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摘要
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A, L and n are the same as in the detailed description.
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