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Substrate cleaning machine, substrate cleaning apparatus, method for manufacturing cleaned substrate, and substrate processing apparatus

机译:基板清洗机,基板清洗装置,清洗后的基板的制造方法以及基板处理装置

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaner which cleans a substrate with clean cleaning members thereby improving the throughput, and to provide a substrate cleaning device, a manufacturing method of a cleaned substrate, and a substrate processing device.SOLUTION: A substrate cleaner 1 includes: a substrate holding device 10 which holds a substrate W; a first cleaning device 11 having a first cleaning member 11a which is placed in contact with a first surface WA of the substrate W held by the substrate holding device 10 to clean the first surface WA; a second cleaning device 12 having a second cleaning member 12a which is placed in contact with the first surface WA of the substrate W held by the substrate holding device 10 to clean the first surface WA; and a control device 50 which controls the first cleaning device 11 and the second cleaning device 12 so that when one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding device 10, the other is located at a position separated from the substrate W held by the substrate holding device 10.
机译:解决的问题:提供一种基板清洁器,其使用清洁的清洁部件清洁基板,从而提高生产率,并提供基板清洁装置,清洁的基板的制造方法和基板处理装置。图1包括:基板保持装置10,其保持基板W;以及第一清洁装置11具有第一清洁构件11a,第一清洁构件11a被放置成与由基板保持装置10保持的基板W的第一表面WA接触以清洁第一表面WA。第二清洁装置12具有第二清洁构件12a,第二清洁构件12a被放置成与由基板保持装置10保持的基板W的第一表面WA接触以清洁第一表面WA。控制装置50控制第一清洁装置11和第二清洁装置12,以使第一清洁构件11a和第二清洁构件12a中的一个清洁由基板保持装置10保持的基板W的第一表面WA。另一个位于与由基板保持装置10保持的基板W分离的位置。

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