首页>
外国专利>
Substrate cleaning machine, substrate cleaning apparatus, method for manufacturing cleaned substrate, and substrate processing apparatus
Substrate cleaning machine, substrate cleaning apparatus, method for manufacturing cleaned substrate, and substrate processing apparatus
展开▼
机译:基板清洗机,基板清洗装置,清洗后的基板的制造方法以及基板处理装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a substrate cleaner which cleans a substrate with clean cleaning members thereby improving the throughput, and to provide a substrate cleaning device, a manufacturing method of a cleaned substrate, and a substrate processing device.SOLUTION: A substrate cleaner 1 includes: a substrate holding device 10 which holds a substrate W; a first cleaning device 11 having a first cleaning member 11a which is placed in contact with a first surface WA of the substrate W held by the substrate holding device 10 to clean the first surface WA; a second cleaning device 12 having a second cleaning member 12a which is placed in contact with the first surface WA of the substrate W held by the substrate holding device 10 to clean the first surface WA; and a control device 50 which controls the first cleaning device 11 and the second cleaning device 12 so that when one of the first cleaning member 11a and the second cleaning member 12a cleans the first surface WA of the substrate W held by the substrate holding device 10, the other is located at a position separated from the substrate W held by the substrate holding device 10.
展开▼