METHOD FOR MANUFACTURING IMPRINTING TEMPLATE SUBSTRATE, IMPRINTING TEMPLATE SUBSTRATE, IMPRINTING TEMPLATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS

摘要

A method for manufacturing an imprinting template substrate forms a protruded mesa portion by removing a part of the substrate, and forms a film containing silicon, carbon, and fluorine, on a side surface of the mesa portion. Even when the template is pressed to the resist, the resist barely adheres to the side surface of the template. Therefore, no defect that the resist having adhered to the side surface of the template falls on the wafer and then defective parts increase, occurs.