首页> 外国专利> Imprinting template substrate, method for manufacturing the same, imprinting template substrate manufacturing apparatus, and method for manufacturing semiconductor apparatus

Imprinting template substrate, method for manufacturing the same, imprinting template substrate manufacturing apparatus, and method for manufacturing semiconductor apparatus

机译:压印模板基板,其制造方法,压印模板基板制造装置以及半导体装置的制造方法

摘要

An imprinting template substrate has a protruded portion, and a protective layer on a side surface of the protruded portion, and having a contact angle higher with respect to a resist material than a contact angle of the protruded portion with respect to the resist material. Even when the template is pressed to the resist, the resist hardly adheres to the side surface of the template. An imprinting process using the present template forms a pattern on a semiconductor substrate and then a semiconductor apparatus is manufactured.
机译:压印模板基板具有突出部和在该突出部的侧面上的保护层,并且相对于抗蚀剂材料的接触角大于该突出部相对于抗蚀剂材料的接触角。即使将模板压在抗蚀剂上,抗蚀剂也几乎不附着在模板的侧面。使用本模板的压印工艺在半导体衬底上形成图案,然后制造半导体装置。

著录项

  • 公开/公告号US10359697B2

    专利类型

  • 公开/公告日2019-07-23

    原文格式PDF

  • 申请/专利权人 TOSHIBA MEMORY CORPORATION;

    申请/专利号US201615066616

  • 发明设计人 NOBUYOSHI SATO;

    申请日2016-03-10

  • 分类号G03F7;

  • 国家 US

  • 入库时间 2022-08-21 12:15:52

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