Cost-Effective Imprint Template Fabrication for Step and Flash Imprint Lithography.

摘要

The College of Nanoscale Science and Engineering (CNSE) is studying imprint template fabrication with the 100kV Vistec VB300 Gaussian E-Beam writer. The major goal is to develop and advance imprint template fabrication technology using low cost quartz wafers for proof-of-concept demonstrations.;The Molecular Imprints NanoImprint Lithography (NIL), ImprioRTM 300 system, uses templates to imprint in a low-viscosity UV cured material at a low pressure and room temperature. This minimizes magnification and distortion errors, and enables precise pattern placement compared to the other imprinting methods such as Soft Lithography and Hot Embossing. However, the cost of writing time on the imprint templates using 100kV Gaussian writer can become expensive. More industry and academic university collaboration is needed. With regard to ITRS requirements in the near future, NIL is a potential candidate for 22nm and beyond.;To advance imprint template fabrication, a low cost quartz wafer development process was demonstrated at CNSE that planned to transfer a specific pattern onto the Molecular Imprints 65mm template format. A number of tools including e-beam, coat/develop and etch were modified to accommodate both the 65mm imprint template and the 3-inch wafer format. Over 100 cycles of learning were completed on 3" quartz wafers and infrastructure strengths and weaknesses in support of imprint template fabrication were identified.