Step and flash imprint lithography template fabrication for emerging market applications

摘要

The Step and Flash Imprint Lithography (S-FIL~TM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.