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A method for reducing of defects in an epitaxial layer
A method for reducing of defects in an epitaxial layer
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机译:一种减少外延层缺陷的方法
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摘要
A method for reducing of defects in an epitaxial layer. The method includes the formation of one or more barriers structures within a circumference edge area of a wafer substrate and the formation of an epitaxial layer over a surface of the wafer substrate.
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