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METHOD FOR THE MATERIAL-SAVING PRODUCTION OF WAFERS AND PROCESSING OF WAFERS

机译:晶片的原材料生产和晶片加工方法

摘要

The present invention relates to a method for producing a multi-component wafer, in particular a MEMS wafer. The method according to the invention comprises at least the following steps: providing a bonding wafer (2), wherein at least one surface portion (4) of the bonding wafer (2) is formed by an oxide film, providing a dispenser wafer (6), wherein the dispenser wafer (6) is thicker than the bonding wafer (2), bringing the dispenser wafer (6) into contact with the surface portion (4) of the bonding wafer (2) that is formed by the oxide film, forming a multilayer arrangement (8) by connecting the dispenser wafer (6) and the bonding wafer (2) in the region of the contact, producing modifications (18) in the interior of the dispenser wafer (6) for predefining a detachment region (11) for separating the multilayer arrangement (8) into a detaching part (14) and a connecting part (16), wherein the production of the modifications (18) takes place before the formation of the multilayer arrangement (8) or after the formation of the multilayer arrangement (8), separating the multilayer arrangement along the detachment region as a result of a weakening of the multilayer arrangement brought about by the production of a sufficient number of modifications or as a result of production of mechanical stresses in the multilayer arrangement, wherein the connecting part (16) remains on the bonding wafer (2) and wherein the split-off detachment part (14) has a greater thickness than the connecting part (16).
机译:本发明涉及一种用于制造多部件晶片,尤其是MEMS晶片的方法。根据本发明的方法至少包括以下步骤:提供接合晶片(2),其中接合晶片(2)的至少一个表面部分(4)由氧化膜形成,提供分配器晶片(6) ),其中分配器晶片(6)的厚度比键合晶片(2)厚,使分配器晶片(6)与由氧化膜形成的键合晶片(2)的表面部分(4)接触,通过在接触区域连接分配器晶圆(6)和键合晶圆(2)形成多层结构(8),在分配器晶圆(6)内部产生修饰(18),以预定义分离区域( 11)用于将多层装置(8)分离为分离部分(14)和连接部分(16),其中变型(18)的生产在多层装置(8)形成之前或在形成之后进行多层布置(8)的一部分,将多层布置分离由于产生足够数量的变型或由于在多层结构中产生机械应力而导致多层结构变弱的结果,其中连接部分(16)保留在粘结上晶片(2),其中分离的分离部分(14)的厚度大于连接部分(16)的厚度。

著录项

  • 公开/公告号EP3280577A1

    专利类型

  • 公开/公告日2018-02-14

    原文格式PDF

  • 申请/专利权人 SILTECTRA GMBH;

    申请/专利号EP20160719224

  • 申请日2016-04-07

  • 分类号B28D1/22;B81C1;

  • 国家 EP

  • 入库时间 2022-08-21 13:16:27

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