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METHOD FOR THE MATERIAL-SAVING PRODUCTION OF WAFERS AND PROCESSING OF WAFERS

机译:晶片的原材料生产和晶片加工方法

摘要

The invention relates to a method for producing a multi-layer assembly. The method according to the invention comprises at least the following steps: providing a donor substrate (2) for removing a solid layer (4), in particular a wafer; producing modifications (12), in particular by means of laser beams (10), in the donor substrate (2) in order to specify a crack course; providing a carrier substrate (6) for holding the solid layer (4); bonding the carrier substrate (6) to the donor substrate (2) by means of a bonding layer (8), wherein the carrier substrate (6) is provided for increasing the mechanical strength of the solid layer (4) for the further processing, which solid layer is to be removed; arranging or producing a stress-producing layer (16) on the carrier substrate (6); thermally loading the stress-producing layer (16) in order to produce stresses in the donor substrate (2), wherein a crack is triggered by the stress production, which crack propagates along the specified crack course in order to remove the solid layer (4) from the donor substrate (2) such that the solid layer (4) is removed together with the bonded carrier substrate (6).
机译:本发明涉及一种用于制造多层组件的方法。根据本发明的方法至少包括以下步骤:提供施主衬底( 2 )以去除固体层( 4 ),特别是晶片;产生修饰( 12 ),特别是通过激光束( 10 )在施主衬底( 2 )中进行修饰,以便指定裂纹过程提供用于保持固体层( 4 )的载体基板( 6 );通过粘结层( 8 )将载体衬底( 6 )结合到施主衬底( 2 ),其中载体衬底( 6 )提供 6 )以提高固体层( 4 )的机械强度,以便进一步处理,该固体层将被去除;在载体基板( 6 )上布置或产生应力产生层( 16 );热加载应力产生层( 16 )以便在施主衬底( 2 )中产生应力,其中应力产生会触发裂纹,裂纹会扩展沿着指定的裂缝走向,以便从施主衬底( 2 )去除固体层( 4 ),以使固体层( 4 )与键合的载体基板( 6 )一起去除。

著录项

  • 公开/公告号US2018243944A1

    专利类型

  • 公开/公告日2018-08-30

    原文格式PDF

  • 申请/专利权人 SILTECTRA GMBH;

    申请/专利号US201615565499

  • 申请日2016-04-07

  • 分类号B28D5;B28D1/22;B23K26;

  • 国家 US

  • 入库时间 2022-08-21 12:57:56

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