METAL CONTAMINATION PREVENTION METHOD AND FILM FORMATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a metal contamination prevention method and a film formation apparatus capable of preventing metal contamination occurring at a time of cleaning the film formation apparatus.SOLUTION: The metal contamination prevention method performed after dry cleaning of a processing chamber used for film formation processing and before film formation is started, includes: a temperature changing step of changing the inside of the processing chamber from a temperature during dry cleaning to a predetermined film forming temperature; an activation step of supplying hydrogen and oxygen into the processing chamber after the temperature changing step and activating the hydrogen and oxygen in the processing chamber; and a step of performing a film forming process in a state in which the substrate is not present in the processing chamber after performing the activating step, and coating the inside of the processing chamber.SELECTED DRAWING: Figure 10