METAL CONTAMINATION PREVENTION METHOD AND FILM FORMATION APPARATUS

摘要

An objective of the present invention is to provide a method for preventing metal contamination capable of preventing metal contamination occurring during cleaning of a film forming apparatus and a film forming apparatus. The method for preventing metal contamination after dry cleaning of a treatment chamber used for film formation and before starting film formation comprises: a temperature changing step of changing the inside of the processing chamber from the temperature during dry cleaning to a predetermined film formation temperature an activation step of supplying hydrogen and oxygen into the processing chamber after performing the temperature changing step and activating the hydrogen and oxygen in the processing chamber; and a step of performing the film formation in a state that no substrate exists in the processing chamber and coating the inside of the process chamber after the activation step is performed.