METAL CONTAMINATION PREVENTION METHOD AND FILM FORMATION APPARATUS

摘要

An object of the present invention is to provide a method for preventing metal contamination and a film forming apparatus capable of preventing metal contamination occurring during cleaning of a film forming apparatus. It is a metal contamination prevention method performed after dry cleaning of the processing chamber used for the film formation process and before the start of film formation, A temperature change step of changing the inside of the processing chamber from a temperature at the time of dry cleaning to a predetermined film formation temperature; and After performing the temperature change step, an activation step of supplying hydrogen and oxygen into the processing chamber and activating the hydrogen and oxygen in the processing chamber; After performing the activation step, there is a step of performing the film forming process in a state in which no substrate is present in the processing chamber, and coating the inside of the processing chamber.