COMPOSITION FOR PASSIVATION LAYER FORMATION, PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PASSIVATION LAYER-ATTACHED SEMICONDUCTOR SUBSTRATE, SOLAR BATTERY ELEMENT, METHOD FOR MANUFACTURING SOLAR BATTERY ELEMENT, AND SOLAR BATTERY

摘要

PROBLEM TO BE SOLVED: To provide a composition for passivation layer formation, which enables the formation of a passivation layer achieving a satisfactory film quality and having an excellent passivation effect by a simple and easy method.;SOLUTION: A composition for passivation layer formation comprises: a compound represented by the general formula (I); and a resin. In the compound represented by the general formula (I), tri-n-butoxy bismuth accounts for 30-100 mass%. Bi(OR¹)_m (I) [R¹'s independently represent an alkyl group, an aryl group or an acyl group; and m represents 3 or 5.];SELECTED DRAWING: None;COPYRIGHT: (C)2019,JPO&INPIT