A deposition step of depositing a layer of graphene oxide; and selectively exposing the deposited graphene oxide region to an electromagnetic wave to form a region of reduced graphene oxide adjacent to an adjacent unexposed region of graphene oxide. Forming the graphene oxide region and the adjacent reduced graphene oxide region to form a junction therebetween to form a graphene oxide / reduced graphene oxide junction layer; and the deposition step and the exposure step. Repeatedly, one or more layers of graphene oxide are further formed on the underlying graphene oxide / reduced graphene oxide junction layer, and each of the junctions of the graphene oxide / reduced graphene oxide layer as a whole is three-dimensionally formed. Creating an extended device. [Selection] Figure 5
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