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Apparatus architecture and method for accurately enhancing performance of vertical semiconductor device

机译:用于精确地增强垂直半导体器件的性能的装置架构和方法

摘要

Improvement of key electrical specifications of vertical semiconductor devices, usually found in the class of devices known as discrete semiconductors, has a direct impact on the performance achievement and power efficiency of the systems in which these devices are used. Imprecise vertical device specifications cause system builders to either screen incoming devices for their required specification targets or to design their system with lower performance or lower efficiency than desired. Disclosed is an architecture and method for achieving a desired target specification for a vertical semiconductor device. Precise trimming of threshold voltage improves targeting of both on-resistance and switching time. Precise trimming of gate resistance also improves targeting of switching time. Precise trimming of a device's effective width improves targeting of both on-resistance and current-carrying capability. Device parametrics are trimmed to improve a single device, or a parametric specification is targeted to match specifications on two or more devices.
机译:通常在称为分立半导体的设备类别中发现的垂直半导体设备的关键电气规格的改进,直接影响使用这些设备的系统的性能和功率效率。不精确的垂直设备规格会导致系统构建者要么筛选传入的设备以查看其所需的规格目标,要么以低于预期的性能或效率来设计其系统。公开了用于实现垂直半导体器件的期望目标规格的架构和方法。精确调整阈值电压可改善导通电阻和切换时间的目标。精确调整栅极电阻还可以改善开关时间的目标。器件的有效宽度的精确修整改善了导通电阻和载流能力的目标。修剪设备参数以改进单个设备,或以参数规格为目标以匹配两个或更多设备上的规格。

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