首页>
外国专利>
RESIST SENSITIVITY AND PROFILE IMPROVEMENT VIA ACID ANION CONTROL DURING FIELD-GUIDED POST EXPOSURE BAKE
RESIST SENSITIVITY AND PROFILE IMPROVEMENT VIA ACID ANION CONTROL DURING FIELD-GUIDED POST EXPOSURE BAKE
展开▼
机译:现场指导的后曝光烘烤过程中通过酸阴离子控制来提高感光度和改善轮廓
展开▼
页面导航
摘要
著录项
相似文献
摘要
Methods disclosed herein provide apparatus and methods for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes. In one embodiment, an apparatus includes a processing chamber configured to apply an electric field to a substrate via a non-gas phase intermediate medium. Methods described herein include dissociation of a photoacid generator to generate anions and cations. The anions may be moved within the photoresist layer by the electric field to more precisely control the speed and location of acid generation and regeneration processes.
展开▼