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Optimal Temperature Profiles for Post-Exposure Bake of Photo-Resist

机译：用于光致抗蚀剂曝光后烘烤的最佳温度曲线

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Anders Hansson; Stephen Boyd;
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年度 2007
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1. Deprotection Blur In Extreme Ultraviolet Photoresists: Influence Of Base Loading And Post-exposure Bake Temperature [J] . Christopher N. Anderson, Patrick P. Naulleau Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2009,第1期

机译：极紫外光致抗蚀剂中的脱保护模糊：基本载荷和曝光后烘烤温度的影响
2. Post-Exposure Bake Temperature Considerations for High Activation Energy Resist Systems [J] . Sanjay Malik, Jeff Eisele, Allyn Whewell, Journal of Photopolymer Science and Technology . 2000,第4期

机译：高活化能抵抗系统的曝光后烘烤温度注意事项
3. Post-Exposure Bake Temperature Considerations for High Activation Energy Resist Systems [J] . Sanjay Malik, Jeff Eisele, Allyn Whewell, Journal of Photopolymer Science and Technology . 2000,第4期

机译：高活化能抵抗系统的曝光后烘烤温度注意事项
4. Optimal temperature profiles for postexposure bake of photoresist [C] . Anders Hansson, Stanford Univ., Stanford, Conference on metrology, inspection, and process control for microlithography . 1998

机译：光刻胶曝光后烘烤的最佳温度曲线
5. Alterations in soybean gene expression profile after foliar application of lipo-chitooligosaccharide (LCO) from Bradyrhizobium japonicum under sub-optimal temperature. [D] . Wang, Nan. 2010

机译：在亚适温下叶面施用日本根瘤菌脂低聚寡糖（LCO）后大豆基因表达谱的变化。
6. Tomato Rootstocks Mediate Plant-Water Relations and Leaf Nutrient Profiles of a Common Scion Under Suboptimal Soil Temperatures [O] . Steven T. Bristow, Leonardo H. Hernandez-Espinoza, Maria-Sole Bonarota, 2020

机译：番茄砧木在次优的土壤温度下调解植物水关系和叶片养分曲线
7. Effects of Photoacid Generator Concentration and Post-Exposure Bake Temperature on Dissolution Behavior of ArF Excimer Laser Resists. [O] . Kenichi Kanzaki, Takeshi Ohfuji, Seiichi Tagawa 1999

机译：光酸发生器浓度及曝光后烘烤温度对ARF准分子激光抗蚀剂溶出行为的影响。

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