首页> 外国专利> PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING AND METHOD OF USING A PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING FOR DEPOSITION OF THIN FILM COATINGS AND MODIFICATION OF SURFACES.

PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING AND METHOD OF USING A PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING FOR DEPOSITION OF THIN FILM COATINGS AND MODIFICATION OF SURFACES.

机译:利用微颗粒减少涂层的等离子体源和利用微颗粒减少涂层的等离子体源用于薄膜涂层的沉积和表面改性的方法。

摘要

The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.
机译:本发明总体上涉及一种利用大颗粒还原涂层的等离子体源,以及一种利用利用大颗粒还原涂层的等离子体源沉积薄膜涂层和表面改性的方法。更具体地,本发明涉及一种包括一个或多个等离子体产生电极的等离子体源,其中在一个或多个电极的等离子体产生表面的至少一部分上沉积大颗粒还原涂层以屏蔽等离子体。 -电极的表面不受所产生的等离子体的侵蚀,并抵抗颗粒物质的形成,从而增强了性能并延长了等离子体源的使用寿命。

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