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Antioxidant coatings and spot size reduction on porous silicon and characterizing luminophore doped xerogels and germanium ultra-thin films.

机译:多孔硅上的抗氧化剂涂层和斑点尺寸减小,并表征了掺杂发光体的干凝胶和锗超薄膜。

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摘要

Characterization is fundamental in new materials synthesis and research, sensors, and optical coatings. This dissertation focuses on characterizing our porous Si (pSi) samples, luminophore doped xerogel based O2 sensing platforms, and ultra-thin Ge optical films. Because our pSi electrochemical etching parameters are unique, we have characterized our pSi porosity, thickness, depth dependent morphology, topography, chemistry, and photoluminescence (PL) based on changes in anodization time. We then used our pSi wafers as a platform for pin-printing and hydrosilylating pSi microarrays. We reduced pin-printed spot sizes by increasing pSi porosity and decreasing reagent viscosity and pin diameter in accordance with the molecular-kinetic theory and Darcy's Law for unidimensional imbibition. We finally coated our "as prepared" pSi samples with various antioxidants (AO) and established a relationship between AO strength, oxidation potential, AO binding to pSi, reduction in PL degradation, and protection against O3 oxidation. Next, we ink-jet printed [Ru(dpp)3]2+ doped hybrid xerogels onto clean glass and compared Stern-Volmer constants, excited state lifetimes, and bimolecular quenching rate constants between spin-coating, pin-printing, and ink-jet printing techniques. Finally, we characterized our ultra-thin Ge film topography and chemistry by using co-localized atomic force microscopy and Raman spectroscopic mapping.
机译:表征是新材料合成和研究,传感器和光学涂层的基础。本文的重点是表征我们的多孔硅(pSi)样品,基于发光体的干凝胶O2传感平台和超薄Ge光学膜的特性。因为我们的pSi电化学蚀刻参数是唯一的,所以我们根据阳极氧化时间的变化对我们的pSi孔隙率,厚度,深度依赖的形貌,形貌,化学和光致发光(PL)进行了表征。然后,我们将pSi晶圆用作pSi微阵列针式印刷和氢化硅烷化的平台。根据分子动力学理论和一维吸收的达西定律,我们通过增加pSi孔隙率和减小试剂粘度和销钉直径来减小销钉印点的尺寸。最后,我们在“准备好的” pSi样品上涂了各种抗氧化剂(AO),并在AO强度,氧化电位,AO与pSi的结合,PL降解的减少以及防止O3氧化之间建立了联系。接下来,我们将[Ru(dpp)3] 2+掺杂的混合干凝胶喷墨印刷到干净的玻璃上,并比较旋涂,针印和油墨之间的Stern-Volmer常数,激发态寿命和双分子猝灭速率常数。喷射印刷技术。最后,我们通过使用共定位原子力显微镜和拉曼光谱图来表征我们的超薄锗薄膜的形貌和化学性质。

著录项

  • 作者

    McCall, Dustin T.;

  • 作者单位

    State University of New York at Buffalo.;

  • 授予单位 State University of New York at Buffalo.;
  • 学科 Chemistry.
  • 学位 Ph.D.
  • 年度 2016
  • 页码 400 p.
  • 总页数 400
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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