Producing optionally-doped coating of amorphous silicon, germanium or their oxides on metallic substrate, subjects area to oxidation before coating deposition

摘要

Locally in the substrate (2), and optionally before deposition of the coating (6), the nitrogen content is increased. In a novel procedure, before coating deposition, the surface (3) area is subjected to oxidation (4). Oxidation follows nitriding. Nitrogen content is increased by plasma-nitriding or plasma nitro-carburizing. Steam is used for oxidation. The coating is doped with carbon and/or nitrogen, at least over a fraction of the layer thickness (5). A concentration gradient of carbon and/or nitrogen is imposed in the coating. Pulsed discharge is used for coating deposition. The layer thickness is 1-25 mu m. Nitriding and/or oxidation are carried out to achieve a layer thickness (7) of 3-50 mu m. The coating is doped with at least one metallic element. It is doped with at least one further non-metallic element. Nitriding, oxidation and deposition of the coating are carried out in a single plant. An independent claim is included for corresponding processing equipment