Coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of metallic oxide

摘要

The method for coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of the metallic oxide. The substrate has a temperature range from room temperature to 90[deg] C during the coating process, and the applied layer is subsequently heat treated. The thermal treatment is made via the separation of a further layer by the conductive layer after breaking of the vacuum in a separate process. The method for coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of the metallic oxide. The substrate has a temperature range from room temperature to 90[deg] C during the coating process, and the applied layer is subsequently heat treated. The thermal treatment is made via the separation of a further layer by the conductive layer after breaking of the vacuum in a separate process. The thermal treatment of the metal oxide layer takes place at = 350[deg] C. The substrate temperature is varied from ambient temperature to 90[deg] C by cleaning before the coating process.