Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II – Characterization of the Films

Gruenwald Johannes; Fricke Katja; Fröhlich Maik; Kolb Jürgen F.; Polak Martin

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Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II – Characterization of the Films

机译：大气压等离子体沉积氧化铜涂层的来源：II –膜的表征

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来源
《Plasma processes and polymers》 |2016年第8期|766-774|共9页
作者
Gruenwald Johannes; Fricke Katja; Fröhlich Maik; Kolb Jürgen F.; Polak Martin;
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作者单位

Leibniz Institute for Plasma Science and Technology (INP) Greifswald Germany;

Leibniz Institute for Plasma Science and Technology (INP) Greifswald Germany;

Leibniz Institute for Plasma Science and Technology (INP) Greifswald Germany;

Leibniz Institute for Plasma Science and Technology (INP) Greifswald Germany;

Leibniz Institute for Plasma Science and Technology (INP) Greifswald Germany;

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原文格式 PDF
正文语种 eng
中图分类
关键词
atmospheric pressure plasma; copper oxide; deposition; nanostructures;

机译：大气压等离子体;氧化铜;沉积;纳米结构;

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1. Deposition of Copper Oxide Coatings With an Atmospheric Pressure Plasma Source: I − Characterization of the Plasma [J] . Gruenwald Johannes, Fricke Katja, Fröhlich Maik, Plasma processes and polymers . 2016,第9期

机译：常压等离子体沉积氧化铜涂层来源：I-等离子体表征
2. Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet [J] . Yung-Sen Lin, Di-Jiun Lin, Ping-Ju Sung, Thin Solid Films . 2013,第apra1期

机译：大气压等离子体射流在大气压等离子体下增强电致变色有机镍氧化物薄膜的化学气相沉积
3. Deposition of Antimicrobial Copper-Rich Coatings on Polymers by Atmospheric Pressure Jet Plasmas [J] . Jana Kredl, Juergen F. Kolb, Uta Schnabel, Materials . 2016,第4期

机译：大气压射流等离子体沉积聚合物上的抗菌富铜涂层
4. Large Area SiO_2 Films Deposition by Atmospheric Pressure Plasma Enhanced Chemical Vapour Deposition (AP-PECVD): Growth Mechanisms by Surface Characterization [C] . P.A. Premkumar, rnS.A. Starostin, rnH. de Vries, 52nd annual technical conference proceedings . 2009

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5. The Development of Novel-Single Source Precursors for the Growth of Zinc Oxide Thin Films via Atmospheric Pressure Metal Organic Chemical Vapor Deposition (AP-MOCVD) For Applications in Microelectronic Devices. [D] . Johnson, Keneshia Onekia. 2013

机译：通过大气压金属有机化学气相沉积（AP-MOCVD）开发用于氧化锌薄膜生长的新型单源前驱体，用于微电子器件。
6. Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition [O] . Elisabeth Jäger, Jürgen Schmidt, Andreas Pfuch, 2019

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Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II – Characterization of the Films

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