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Linear Plasma Sources for Surface Modification and Deposition for Large Area Coating

机译:线性等离子源,用于大面积涂层的表面改性和沉积

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Plasma sources play an important role in the areas of surface functionalization, coating densification, and plasma-enhanced deposition. One difficulty with many types of plasma sources is their scalability to large-area coating systems, such as web and glass coaters. Linear plasma sources show great promise as they can be easily scaled to lengths of 4 meters or more while maintaining good uniformity; they are also easy to maintain and have a low contamination rate. Linear ion sources have been successfully introduced in glass coating applications [1-2] although there are still a large number of glass coaters using other plasma treatments or even non-plasma cleaning solutions. Polymers and glass substrates typically need to be functionalized or etched to improve adhesion. Contaminates such as fingerprints and organics can be removed by including gases such as oxygen in the ion beam. Coatings to improve scratch resistance, tri-bological properties, and encapsulation can be deposited via such methods. Modification of coating density and proper- ties is also possible. This paper presents some examples of the coating technology.
机译:等离子体源在表面功能化,涂层致密化和等离子体增强沉积方面起着重要作用。许多类型的等离子体源的一个难题是它们对于大面积涂布系统(例如卷筒纸和玻璃涂布机)的可扩展性。线性等离子体源显示出巨大的希望,因为它们可以轻松缩放至4米或更长的长度,同时保持良好的均匀性。它们也易于维护且污染率低。线性离子源已经成功地引入到玻璃涂层应用中[1-2],尽管仍然有大量的玻璃涂层器使用其他等离子体处理甚至非等离子体清洁溶液。通常需要对聚合物和玻璃基板进行功能化或蚀刻,以提高附着力。通过在离子束中包含诸如氧气之类的气体,可以去除诸如指纹和有机物之类的污染物。可以通过这样的方法来沉积用于改善耐刮擦性,摩擦学特性和封装性的涂层。也可以改变涂层的密度和性能。本文介绍了一些涂层技术的例子。

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