首页> 外国专利> METHOD FOR MANUFACTURING LARGE-AREA METAL CHALCOGENIDE THIN FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE COMPRISING METAL CHALCOGENIDE THIN FILM MANUFACTURED THEREBY

METHOD FOR MANUFACTURING LARGE-AREA METAL CHALCOGENIDE THIN FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE COMPRISING METAL CHALCOGENIDE THIN FILM MANUFACTURED THEREBY

机译:制造具有大面积金属硫属化物薄膜的电子设备的方法以及制造该电子设备的方法

摘要

The present invention relates to a method for manufacturing a large-area metal chalcogenide thin film and a device comprising the large-area metal chalcogenide thin film manufactured thereby, the method comprising the steps of: preparing a polymer-precursor solution; coating a substrate with the polymer-precursor solution; and heat-treating the substrate coated with the polymer-precursor solution. A high-quality, large-area metal chalcogenide thin film having a uniform thickness and composition can be manufactured at low cost according to the manufacturing method of the present invention.
机译:本发明涉及一种大面积金属硫属化物薄膜的制造方法和包含该大面积金属硫属化物薄膜的装置,该方法包括以下步骤:制备聚合物前体溶液;用聚合物前体溶液涂覆基底;热处理涂覆有聚合物前体溶液的基材。根据本发明的制造方法,可以以低成本制造具有均匀的厚度和组成的高质量,大面积的金属硫属化物薄膜。

著录项

  • 公开/公告号WO2018143611A1

    专利类型

  • 公开/公告日2018-08-09

    原文格式PDF

  • 申请/专利权人 POSTECH ACADEMY-INDUSTRY FOUNDATION;

    申请/专利号WO2018KR01166

  • 发明设计人 JEONG UNYONG;GIRI ANUPAM;YANG HEESEUNG;

    申请日2018-01-26

  • 分类号B05D7/24;B05D3/02;C23C18/12;C23C18/04;B05D3/14;H01L45;

  • 国家 WO

  • 入库时间 2022-08-21 12:43:09

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