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Thin-Film Edge Field Emitter Device and Method of Manufacture Therefor

机译:薄膜边缘场发射器装置及其制造方法

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A thin-film edge field emitter device includes a substrate having a first portionand having a protuberance extending from the first portion, the protuberance defining at least one side-wall, the side-wall constituting a second portion. An emitter layer is disposed on the substrate including the second portion, the emitter layer being selected from the group consisting of semiconductors and conductors and is a thin-film including a portion extending beyond the second portion and defining an exposed emitter edge. A pair of supportive layers is disposed on opposite sides of the emitter layer, the pair of supportive layers each being selected from the group consisting of semiconductors and conductors and each having a higher work function than the emitter layer. (jg).

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