Negative-acting active ray-sensitive or radiation-sensitive resin composition, negative-acting active ray-sensitive or radiation-sensitive film, pattern forming method, and manufacturing method of electronic device

摘要

Particularly, in the formation of a pattern of ultrafine (for example, a line width of 50 nm or less), it is possible to form a pattern having excellent sensitivity, resolution, PED stability, and line edge roughness (LER) And a mask blank having a negative active ray-sensitive or radiation-sensitive film, a negative active ray-sensitive or radiation-sensitive film using the same, a pattern forming method, and an electron A method of manufacturing a device is provided. Mask blank is, (A) to by a polymer having a repeating unit represented by the general formula (1) compound and, (B) irradiation of actinic ray or radiation, and the volume is 130Å ³ above comprising a compound capable of generating an 2000Å ³ or less acid Sensitive negative active radiation-sensitive or radiation-sensitive resin composition, and negative-acting actinic ray-sensitive or radiation-sensitive film and negative-acting actinic radiation-sensitive or radiation-sensitive film using the negative active radiation or radiation-sensitive resin composition. Wherein R ₁ represents a hydrogen atom, an alkyl group or a halogen atom, R ₂ and R ₃ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group or an aryl group, R ₄ represents a hydrogen atom An alkyl group, a cycloalkyl group, an aryl group, or an acyl group; L represents a single bond or a divalent linking group; Ar represents an aromatic group; and m and n each independently represent an integer of 1 or more.