ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIN FOR ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

摘要

Provided are: an active ray-sensitive or radiation-sensitive resin composition which has excellent resolution and roughness properties, rarely undergoes the formation of scums, has excellent CDU and also has excellent long-term stability; a method for producing a resin for an active ray-sensitive or radiation-sensitive resin composition; and an active ray-sensitive or radiation-sensitive film, a method for forming a pattern and a method for manufacturing an electronic device, in each of which the composition is used. The active ray-sensitive or radiation-sensitive resin composition contains the following components (A) to (C), wherein the content of a compound of which a conjugated acid has a pKa value of 4.0 or more is 1 ppm by mass or less relative to the total mass of all of solid materials. (A) A resin which has a repeating unit represented by general formula (1), can be decomposed by the action of an acid, and can be increased in solubility in an alkaline developing solution; (B) a compound which can generate an acid upon the irradiation with active ray or radioactive ray; and (C) a fluorinated compound which can be decomposed by the action of an alkaline developing solution and has a group that can be increased in solubility in an alkaline developing solution. In general formula (1), R₁ represents a hydrogen atom or a monovalent organic group; X₁ represents a bivalent linking group; and Y₁ and Z₁ independently represent a monovalent organic group, wherein Y₁ and Z₁ may be linked to each other to form a ring.