TRANSFER CHAMBER, SUBSTRATE PROCESSING SYSTEM HAVING SAME, AND SUBSTRATE PROCESSING METHOD OF SUBSTRATE PROCESSING SYSTEM USING SAME

摘要

The present invention relates to a transfer chamber transferring a pair of carriers including at least one of a substrate carrier and a mask carrier being perpendicular to the ground, and a transfer chamber of a substrate processing system including at least a pair of process chambers coupled to the transfer chamber by forming a processing space to process a substrate. The transfer chamber comprises: a rail unit formed to have a pair of rails to be in parallel along a transfer direction of a carrier to move a pair of carriers introduced to the transfer chamber; a rail rotation unit for rotating the rail unit to introduce or extract the pair of carrier to or from the process chamber; and a rail interval adjustment unit for adjusting an interval between the pair of rails. Therefore, the productivity in substrate processing can be improved, and a space and costs required for configuring a system can be reduced.;COPYRIGHT KIPO 2018