Apparatus for vacuum processing of a substrate, system for vacuum processing of a substrate, and method for transferring a substrate carrier and a mask carrier in a vacuum chamber

摘要

The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) comprises a vacuum chamber, a first track arrangement (110) adapted to transfer a substrate carrier (120), a second track arrangement (configured to transfer a mask carrier (140) 130) and a holding arrangement configured to position the substrate carrier (120) and the mask carrier (140) relative to one another. The first track arrangement (110) comprises a first portion configured to support a substrate carrier (120) at a first end (12) of the substrate (10) and a substrate carrier (120) 10) and a second portion configured to support at a second end (14) of the substrate (10) opposite the first end (12). The second track arrangement (120) comprises a further first portion configured to support the mask carrier (140) at the first end (22) of the mask (20), and the mask carrier (140) And a further second portion configured to support at a second end (24) of the mask opposite the first end (22) of the mask (20). A first distance (D) between a first part and a second part of the first track arrangement (110), and a further first part of the second track arrangement (130) The second distance (D ') between the second part is essentially the same. [Selected figure] Figure 1B