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The apparatus for the vacuum processing of the substrate and the method for the transfer of the substrate carrier within the system for the vacuum processing of the substrate and vacuum chamber and mask carrier
The apparatus for the vacuum processing of the substrate and the method for the transfer of the substrate carrier within the system for the vacuum processing of the substrate and vacuum chamber and mask carrier
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机译:用于衬底的真空处理的设备以及用于在衬底的真空处理系统中转移衬底载体的方法以及真空室和掩模载体
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摘要
An apparatus for vacuum processing of a substrate is described. The apparatus includes a vacuum chamber, a substrate transfer assembly, a mask transfer assembly, and an alignment system, the alignment system having an actuator and a mechanical isolation element between the actuator and the vacuum chamber.
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