The present invention restrains attachment of a sublimate to an inner surface of a chamber. According to an embodiment, the substrate heating apparatus comprises: a chamber having a storage space therein to be capable of storing a substrate where solution is applied; a decompression unit capable of decompressing the atmosphere of the storage space; a substrate heating unit capable of heating the substrate while arranged on at least one side among one side or the other side of the substrate; and a chamber heating unit heating at least a portion of an inner surface of the chamber.
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