Endpoint detection algorithm for atomic layer etching (ALE)

摘要

Described herein are structures, platforms, and methods for determining the endpoints of optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data includes, for example, an adsorption step process, a desorption step process, or a combination thereof. In this embodiment, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination. This may be done through the application of a moving average filter.