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Endpoint detection algorithm for atomic layer etching (ALE)
Endpoint detection algorithm for atomic layer etching (ALE)
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机译:原子层蚀刻(ALE)的端点检测算法
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摘要
Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption—step process, a desorption—step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.
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