AQUEOUS LOW ABRASION GRAIN SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITION FOR USE IN SHALLOW TRENCH ISOLATION SEPARATION, AND MANUFACTURING METHOD AND APPLICATION METHOD THEREOF

摘要

To provide an aqueous silica slurry capable of oxide dishing control and oxide:nitride removal speed selection ratio used for shallow trench isolation (STI) applications.SOLUTION: There is provided an aqueous chemical mechanical flattening (CMP) polishing composition containing a colloidal silica having zeta potential of +5 to +50 mV, and one or more aminosilane group, preferably an extensible, flexible or knotting colloidal silica, more preferably such particle containing a cationic nitrogen atom; and at least an amino heterocyclic carboxylic acid having isoelectric point (pI) of 2.5 to 5, preferably 3 to 4. The composition has pH of 2.5 to 5.3. Preferably the amine heterocyclic carboxylic acid is amine-containing heterocyclic monocarboxylic acid such as nicotinic acid, picolinic acid, or isonicotinic acid. The composition can enhance removal speed ratio of oxide;nitride.SELECTED DRAWING: None