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Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing

机译：纳米复印件对浅沟槽隔离化学机械抛光的表面活性剂加入对烟雾二氧化硅和二氧化硅浆料的依赖性

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Kyu-Chul Cho; Hyeong-Tag Jeon; Jea-Gun Park;
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年度 2006
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1. Dependence of Nanotopography Impact on Abrasive Size and Surfactant Concentration in Ceria Slurry for Shallow Trench-Isolation Chemical Mechanical Polishing [J] . Hyun-Goo KANG, Takeo KATOH, Won-Mo LEE, Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第1AaB期

机译：纳米形貌对浅沟槽隔离化学机械抛光中二氧化铈浆料中磨料尺寸和表面活性剂浓度的影响
2. Nanotopography Impact and Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP) [J] . Takeo KATOH, Min-Seok KIM, Ungyu PAIK, Japanese Journal of Applied Physics. Part 1, Regular Papers & Short Notes . 2004,第2A期

机译：浅沟槽隔离化学机械抛光（STI-CMP）中二氧化铈浆料的纳米形貌影响和非Prestonian行为
3. Dependence of Non-Prestonian Behavior of Ceria Slurry with Anionic Surfactant on Abrasive Concentration and Size in Shallow Trench Isolation Chemical Mechanical Polishing [J] . Hyun-Goo Kang, Dae-Hyeong Kim, Takeo Katoh, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2006,第5A期

机译：浅沟槽隔离化学机械抛光中二氧化铈浆料与阴离子表面活性剂的非Prestonian行为对磨料浓度和粒度的依赖性
4. Nanotopography Impact in Shallow Trench Isolation Chemical Mechanical Polishing-Dependence on Slurry Characteristics [C] . Jea-Gun Park, Takeo Katoh, Ungyu Paik Journal of Rare Earths . 2004

机译：浅沟槽隔离化学机械抛光中的纳米形貌影响-取决于浆料特性
5. A Study of the Colloidal Stability of Mixed Abrasive Slurries of Silica and Ceria Nanoparticles for Chemical Mechanical Polishing. [D] . Lin, Fangjian. 2011

机译：用于化学机械抛光的二氧化硅和二氧化铈纳米颗粒混合磨料浆料的胶体稳定性研究。
6. Effect of slurry composition on the chemical mechanical polishing of thin diamond films [O] . Jessica M. Werrell, Soumen Mandal, Evan L. H. Thomas, 2017

机译：浆料组成对金刚石薄膜化学机械抛光的影响
7. Modeling of chemical mechanical polishing for shallow trench isolation [O] . Lee Brian 1975- 2002

机译：浅沟槽隔离化学机械抛光建模

Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing

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