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Method of stress relaxation in an antireflective coated cap wafer of infrared focal plane array wafer level packaged
Method of stress relaxation in an antireflective coated cap wafer of infrared focal plane array wafer level packaged
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机译:封装红外焦平面阵列晶圆级防反射涂层盖晶圆中应力松弛的方法
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摘要
Methods for reducing wafer bow induced by an anti -reflective coating of a cap wafer are provided. The method may utilize a shadow mask having at least one opening therein that is positioned opposite recessed regions in a cap wafer. The method may further include depositing at least one layer of an anti-reflective coating material through the shadow mask onto a planar side of a cap wafer to provide a discontinuous coating on the planar side.
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