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Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging

机译:Precision integration of grating-based polarizers onto focal plane arrays of near-infrared photovoltaic detectors for enhanced contrast polarimetric imaging

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摘要

Polarimetric imaging enhances the ability to distinguish objects from a bright background by detecting their particular polarization status,which offers another degree of freedom in infrared remote sensing.However,to scale up by monolithically integrating grating-based polarizers onto a focal plane array(FPA)of infrared detectors,fundamental technical obstacles must be overcome,including reductions of the extinction ratio by the misalignment between the polarizer and the detector,grating line width fluctuations,the line edge roughness,etc.This paper reports the authors’latest achievements in overcoming those problems by solving key technical issues regarding the integration of large-scale polarizers onto the chips of FPAs with individual indium gallium arsenide/indium phosphide(In Ga As/In P)sensors as the basic building blocks.Polarimetric and photovoltaic chips with divisions of the focal plane of 540×4 pixels and 320×256 superpixels have been successfully manufactured.Polarimetric imaging with enhanced contrast has been demonstrated.The progress made in this work has opened up a broad avenue toward industrialization of high quality polarimetric imaging in infrared wavelengths.

著录项

  • 来源
    《极端制造(英文)》 |2021年第003期|P.95-102|共8页
  • 作者单位

    Nanolithography and Application Research Group State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433 People’s Republic of China;

    Nanolithography and Application Research Group State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433 People’s Republic of China;

    State Key Laboratories of Transducer Technology Shanghai Institute of Technical Physics Chinese Academy of Sciences Shanghai 200083 People’s Republic of China;

    Nanolithography and Application Research Group State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433 People’s Republic of China;

    State Key Laboratories of Transducer Technology Shanghai Institute of Technical Physics Chinese Academy of Sciences Shanghai 200083 People’s Republic of China;

    State Key Laboratories of Transducer Technology Shanghai Institute of Technical Physics Chinese Academy of Sciences Shanghai 200083 People’s Republic of China;

    State Key Laboratories of Transducer Technology Shanghai Institute of Technical Physics Chinese Academy of Sciences Shanghai 200083 People’s Republic of China;

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  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 光电子技术、激光技术;
  • 关键词

    polarimetric imaging; grating based polarizer; InGaAs/InP; focal plane array; nanofabrication;

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