首页> 外国专利> GROWING METHOD INHIBITING CARBON INCLUSION DEFECTS IN SILICON CARBIDE MONOCRYSTALS

GROWING METHOD INHIBITING CARBON INCLUSION DEFECTS IN SILICON CARBIDE MONOCRYSTALS

机译:抑制碳化硅单晶中碳夹杂缺陷的生长方法

摘要

The present invention relates to the technical field of crystal growing, and specifically relates to a growing method inhibiting carbon inclusion defects in silicon carbide monocrystals. The method described in the present invention divides growth into two phases, inhibiting volatilization and escape of a silicon component by means of controlling different pressures, decreasing, or even eliminating, formation of inclusions; the growing method described in the present invention does not require addition of an external substance to growing raw materials, as inhibition of carbon inclusion formation may be realized by means of only simple adjustments of growing techniques, the method being easily implemented and relatively low-cost.
机译:本发明涉及晶体生长技术领域,尤其涉及一种抑制碳化硅单晶中碳夹杂缺陷的生长方法。本发明中描述的方法将生长分为两个阶段,通过控制不同的压力来抑制硅组分的挥发和逸出,减少或什至消除夹杂物的形成。本发明中描述的生长方法不需要向生长的原材料中添加外部物质,因为可以仅通过简单调整生长技术来实现对碳夹杂物形成的抑制,该方法易于实施且成本相对较低。 。

著录项

  • 公开/公告号WO2019001119A1

    专利类型

  • 公开/公告日2019-01-03

    原文格式PDF

  • 申请/专利权人 SICC CO. LTD;

    申请/专利号WO2018CN84348

  • 申请日2018-04-25

  • 分类号C30B29/36;C30B23;

  • 国家 WO

  • 入库时间 2022-08-21 11:57:30

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