首页> 外国专利> Method and apparatus for sublimation growth of silicon carbide single crystal (PROCESS AND DEVICE FOR SUBLIMATION GROWING SILICON CARBIDE MONOCRYSTALS)

Method and apparatus for sublimation growth of silicon carbide single crystal (PROCESS AND DEVICE FOR SUBLIMATION GROWING SILICON CARBIDE MONOCRYSTALS)

机译:用于升华生长碳化硅单晶的方法和设备(用于碳化硅单晶的增生生长的方法和装置)

摘要

the reaction chamber (2) and a top wall (20) of the ring, the wall (2), at least one of the reaction room (2), the internal CVD project (21) is made of a carbide is composed. the wall (20) of the silicon carbide of at least a part of the distillation can be decided (3) on a silicon carbide single crystal (4) - growth.
机译:反应室(2)和顶壁(20)的环,壁(2),反应室(2)中的至少一个,内部CVD突起(21)由碳化物制成。蒸馏的至少一部分的碳化硅的壁(20)可以在碳化硅单晶(4)上确定(3)生长。

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