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Pull condition calculation program of silicon single crystal, method of improving hot zone of silicon single crystal and silicon single crystal growing method

机译:硅单晶的拉伸条件计算程序,改善硅单晶热区的方法和硅单晶生长方法

摘要

The pulling condition calculation program sets a plurality of pulling conditions corresponding to the solid-liquid interface height and the distance between the liquid surface of the silicon single crystal and the heat shield plate, and for each pulling condition, the heat flux q (W / m 2 ) and the crystal surface Calculating the temperature T (S2), setting the reference temperature Tref given by the following equation (1), setting the solid-liquid interface shape as the boundary condition, and recalculating the temperature distribution in the crystal (S3). Calculating the average stress in the silicon single crystal (S4), calculating the defect distribution in the pulling direction based on the average stress and the temperature distribution in the crystal (S5), obtaining a defect free area in the pulling direction (S6), The computer generates a step S8 of generating a contour line of the size of the defect-free area on the two-dimensional map of the distance and the liquid interface height.
机译:拉拔条件计算程序设定与固液界面高度和硅单晶的液面与隔热板之间的距离相对应的多个拉拔条件,对于每个拉拔条件,热通量q(W / m 2 )和晶体表面计算温度T(S2),设置下式(1)给出的参考温度Tref,将固液界面形状设置为边界条件,然后重新计算晶体中的温度分布(S3)。计算硅单晶中的平均应力(S4),基于晶体中的平均应力和温度分布计算提拉方向上的缺陷分布(S5),获得提拉方向上的无缺陷区域(S6),计算机生成步骤S8,该步骤在距离和液体界面高度的二维图上生成无缺陷区域的大小的轮廓线。

著录项

  • 公开/公告号KR20190100323A

    专利类型

  • 公开/公告日2019-08-28

    原文格式PDF

  • 申请/专利权人 가부시키가이샤 사무코;

    申请/专利号KR20197021840

  • 发明设计人 스에와카 료타;

    申请日2017-12-07

  • 分类号C30B15/22;C30B29/06;

  • 国家 KR

  • 入库时间 2022-08-21 11:49:55

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