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SILICON SINGLE CRYSTAL PULLING CONDITION CALCULATION PROGRAM, SILICON SINGLE CRYSTAL HOT ZONE IMPROVEMENT METHOD, AND SILICON SINGLE CRYSTAL GROWING METHOD
SILICON SINGLE CRYSTAL PULLING CONDITION CALCULATION PROGRAM, SILICON SINGLE CRYSTAL HOT ZONE IMPROVEMENT METHOD, AND SILICON SINGLE CRYSTAL GROWING METHOD
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机译:硅单晶拉拔条件计算程序,硅单晶热区改进方法和硅单晶生长方法
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摘要
PROBLEM TO BE SOLVED: To provide a silicon single crystal pulling condition calculation program capable of determining an optimal heat shielding plate distance and a solid/liquid interface height.SOLUTION: Provided is a pulling condition calculation program that causes a computer to execute the following steps: a step S2 of setting a plurality of pulling conditions according to a solid/liquid interface height and a distance between a liquid surface of a silicone single crystal and a heat shielding plate, and calculating a heat flux q (W/m) and a crystal surface temperature (T) for each of the pulling conditions; a step of setting a reference temperature Tref given by a formula (1) and a solid/liquid interface shape as boundary conditions; a step S3 of recalculating a crystal internal temperature distribution; a step S4 of calculating an average stress within the silicon single crystal; a step S5 of calculating a pulling direction defect distribution based on the average stress and the crystal internal temperature distribution; a step S6 of determining a defect-free region in the pulling direction; and a step S8 of generating contour lines of the size of the defect-free region on a two-dimensional map of the distance and the solid/liquid interface height.SELECTED DRAWING: None
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