首页> 外国专利> Apparatus for vacuuming a substrate, system for vacuuming a substrate, and method for transporting a substrate carrier and a mask carrier in a vacuum chamber

Apparatus for vacuuming a substrate, system for vacuuming a substrate, and method for transporting a substrate carrier and a mask carrier in a vacuum chamber

机译:用于抽真空基板的设备,用于抽真空基板的系统以及在真空室中运送基板载体和掩模载体的方法

摘要

A method for transporting a substrate carrier and a mask carrier in a vacuum chamber that accurately and smoothly transports the substrate carrier and the mask carrier through a processing system. An apparatus for vacuum processing a substrate includes a vacuum chamber including a chamber wall, a substrate carrier having a support surface, a mask carrier, and an alignment system. The alignment system has an actuator 318 and a mechanical isolation element 312 between the actuator and the vacuum chamber.
机译:一种用于在真空室中运送基板载体和掩模载体的方法,其通过处理系统精确且平稳地运送基板载体和掩模载体。一种用于对基板进行真空处理的设备,包括:具有腔室壁的真空室;具有支撑表面的基板载体;掩模载体;以及对准系统。对准系统具有致动器318和在致动器与真空室之间的机械隔离元件312。

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