首页> 外国专利> Apparatus for vacuuming a substrate, system for vacuuming a substrate, and method for transporting a substrate carrier and a mask carrier in a vacuum chamber

Apparatus for vacuuming a substrate, system for vacuuming a substrate, and method for transporting a substrate carrier and a mask carrier in a vacuum chamber

机译:用于抽真空基板的设备,用于抽真空基板的系统以及在真空室中运送基板载体和掩模载体的方法

摘要

An apparatus for vacuum processing of a substrate is described. The apparatus includes a vacuum chamber, a substrate transport assembly, a mask transport assembly, and an alignment system having an actuator and a mechanical isolation element between the actuator and the vacuum chamber.
机译:描述了一种用于基板的真空处理的设备。该设备包括真空腔室,衬底传送组件,掩模传送组件以及对准系统,该对准系统具有致动器和在致动器和真空腔之间的机械隔离元件。

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