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Palladium-coated copper bonding wire, wire bonding structure, semiconductor device, and method for manufacturing semiconductor device

机译:镀钯铜焊线,焊线结构,半导体装置以及半导体装置的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a palladium-coated copper bonding wire which does not generate shrinkage cavities at the time of first bonding, has high bonding reliability, and can stably maintain excellent bonding reliability for a long period of time even in a high temperature and high humidity environment. Providing a bonded structure, a semiconductor device, and a method for manufacturing the semiconductor device. A bonding wire is a Pd-coated copper bonding wire having a copper core material and a Pd layer and containing a sulfur group element, and the total of copper, Pd and sulfur group elements is Pd. The concentration is 1.0 mass% to 4.0 mass%, the total concentration of group sulfur elements is 50 mass ppm or less, the S concentration is 5 mass ppm to 2 mass ppm, or the Se concentration is 5 mass ppm to 20 mass ppm. Alternatively, the Te concentration is 15 mass ppm to 50 mass ppm or less, and the Pd concentration is 2.0 with respect to the total of Al, copper, and Pd in the vicinity of the joint surface between the electrode containing Al of the semiconductor chip and the ball joint. A wire bonding structure having a Pd concentrated bonding region having a mass% or more. [Selection diagram] Fig. 1
机译:解决的问题:提供一种钯包覆的铜键合线,该键合线在第一次键合时不产生缩孔,键合可靠性高,即使在高温下也能长时间稳定地保持优异的键合可靠性。和高湿度的环境。提供一种键合结构,半导体器件以及用于制造该半导体器件的方法。键合线是具有铜芯材料和Pd层并且包含硫族元素的Pd包覆的铜键合线,并且铜,Pd和硫族元素的总和为Pd。浓度为1.0质量%至4.0质量%,族硫元素的总浓度为50质量ppm以下,S浓度为5质量ppm至2质量ppm,或Se浓度为5质量ppm至20质量ppm。或者,相对于半导体芯片的包含Al的电极之间的接合面附近的Al,铜和Pd的合计,Te浓度为15质量ppm〜50质量ppm以下,Pd浓度为2.0。和球窝。具有Pd集中键合区域的质量百分比或更高的引线键合结构。 [选择图]图1

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