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Atomic Layer Deposition Methods for Selective Membrane Growth
Atomic Layer Deposition Methods for Selective Membrane Growth
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机译:选择性膜生长的原子层沉积方法
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摘要
A method for forming a metal-containing film by atomic layer deposition is provided. The method delivers the metal-containing complex, purge gas, and copolymer to the first substrate under conditions sufficient for the metal-containing membrane to selectively grow on at least a portion of the first substrate. Includes steps.
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