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Non-volatile memory device having nanocrystal floating gate and method of fabricating same

机译:具有纳米晶体浮栅的非易失性存储器件及其制造方法

摘要

Non-volatile memory devices and methods of fabricating thereof are disclosed herein. An exemplary non-volatile memory device includes a heterostructure disposed over a substrate. A gate structure traverses the heterostructure, such that the gate structure separates a source region and a drain region of the heterostructure and a channel region is defined between the source region and the drain region. The non-volatile memory device further includes a nanocrystal floating gate disposed in the channel region of the heterostructure between a first nanowire and a second nanowire. The first nanowire and the second nanowire extend between the source region and the drain region.
机译:本文公开了非易失性存储器件及其制造方法。示例性的非易失性存储器件包括设置在衬底上方的异质结构。栅极结构横穿异质结构,使得栅极结构将异质结构的源极区和漏极区分开,并且在源极区和漏极区之间限定了沟道区。非易失性存储器件还包括布置在第一纳米线和第二纳米线之间的异质结构的沟道区中的纳米晶体浮栅。第一纳米线和第二纳米线在源极区和漏极区之间延伸。

著录项

  • 公开/公告号US10529729B2

    专利类型

  • 公开/公告日2020-01-07

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.;

    申请/专利号US201815890523

  • 发明设计人 JEAN-PIERRE COLINGE;CARLOS H DIAZ;

    申请日2018-02-07

  • 分类号H01L29/06;H01L27/11551;H01L29/423;H01L29/41;H01L29/66;H01L29/49;H01L21/28;H01L29/786;B82Y10;H01L29/775;H01L29/40;

  • 国家 US

  • 入库时间 2022-08-21 11:18:58

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